SOURCE REAGENT-BASED DELIVERY OF FLUID WITH HIGH MATERIAL FLUX FOR BATCH DEPOSITION

To provide a system that supplies source reagent vapor at a consistent, controlled, and reproducible rate.SOLUTION: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel 100 having one or more interior walls enclo...

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Bibliographische Detailangaben
Hauptverfasser:	SCOTT L BATTLE, CHEON SEBUM, JORDAN HODGES, DONN K NAITO, JOHN M CLEARY, JOHN N GREGG, KYLE BARTOSH, HENDRIX BRYAN C
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a system that supplies source reagent vapor at a consistent, controlled, and reproducible rate.SOLUTION: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel 100 having one or more interior walls enclosing an interior volume and a plurality of reagent support trays 110, 120, 130, 140 configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.SELECTED DRAWING: Figure 1 【課題】ソース試薬蒸気を、ばらつきがなく、制御され、かつ再現可能な速度で供給するシステムを提供する。【解決手段】システム、試薬支持トレイ、粒子抑制デバイス及び方法が開示される。一態様において、システムは、内部容積を包囲する１以上の内壁を有する気化器容器１００と、内部容積内で垂直に積層可能に構成された複数の試薬支持トレイ１１０、１２０、１３０、１４０と、を含む。複数の試薬支持トレイの各々は、試薬支持トレイのスタックを形成するように内部容積内で垂直に積層可能に構成される。複数の試薬支持トレイのうちの１以上は、試薬支持トレイのスタック中の隣接する試薬支持トレイの間を進むガス流を方向転換させることにより、該ガス流が特定の試薬支持トレイ内のソース試薬材料と相互に作用した後に、試薬支持トレイのスタックにおける複数の試薬支持トレイのうちの次の試薬支持トレイ内に進むことになるように構成される。【選択図】図１