VACUUM DRYER AND VACUUM DRYING METHOD
To provide a technique capable of improving the uniformity of vacuum drying processing.SOLUTION: A vacuum dryer according to one aspect of the present disclosure performs vacuum drying processing to dry a liquid on a substrate in a vacuum state. The vacuum dryer according to an embodiment includes a...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide a technique capable of improving the uniformity of vacuum drying processing.SOLUTION: A vacuum dryer according to one aspect of the present disclosure performs vacuum drying processing to dry a liquid on a substrate in a vacuum state. The vacuum dryer according to an embodiment includes a chamber, a plurality of lift pins and a stage. The chamber houses the substrate. Each of the lift pins has a head part in contact with the lower face of the substrate and a rod part connected to the head part, and can be raised and lowered between a lifting position when the substrate is delivered and a lowering position when the vacuum drying processing is performed. The stage has a plurality of insertion holes through which the rod parts are inserted, respectively. The head part has, on at least part of the top surface thereof, a flat surface that is flush with the top surface of the stage at the lowering position.SELECTED DRAWING: Figure 3
【課題】減圧乾燥処理の均一性を向上させることができる技術を提供する。【解決手段】本開示の一態様による減圧乾燥装置は、減圧乾燥装置は、基板上の液体を減圧状態で乾燥させる減圧乾燥処理を行う。実施形態に係る減圧乾燥装置は、チャンバと、複数のリフトピンと、ステージとを備える。チャンバは、基板を収容する。リフトピンは、基板の下面に接触するヘッド部およびヘッド部に接続されるロッド部を有し、基板の受け渡しを行う際の上昇位置と減圧乾燥処理を行う際の下降位置との間で昇降可能である。ステージは、ロッド部が挿通される挿通孔を複数有する。また、ヘッド部は、上面の少なくとも一部に、下降位置においてステージの上面と面一となる平坦面を有する。【選択図】図3 |
---|