BASE MATERIAL FILM, LAMINATE, AND METHOD FOR MANUFACTURING THEM

To provide a base material film, a laminate and a method for manufacturing them, which are capable of reducing irregularities generated in a liquid crystal layer formed on the base material film.SOLUTION: A base material film is one to which a coating liquid including a liquid crystal compound is ap...

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Hauptverfasser:	NAKANISHI YUSUKE, SOFUE SHOJI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	To provide a base material film, a laminate and a method for manufacturing them, which are capable of reducing irregularities generated in a liquid crystal layer formed on the base material film.SOLUTION: A base material film is one to which a coating liquid including a liquid crystal compound is applied. A standard deviation of silicon element content on a surface of the base material film to which the coating liquid is applied is 0.04-0.09.SELECTED DRAWING: Figure 1 【課題】基材フィルム上に形成された液晶層に発生するムラを抑制することができる、基材フィルム、積層体、及びこれらの製造方法を提供する。【解決手段】基材フィルムは、液晶化合物を含む塗布液が塗布される基材フィルムである。基材フィルムの塗布液が塗布される側の表面におけるケイ素元素量の標準偏差は、０．０４以上０．０９以下である。【選択図】図１