VACUUM DEVICE, APPARATUS AND METHOD FOR MONITORING DEPOSITION OF BY-PRODUCT

To provide a method for monitoring deposition of by-products in a vacuum device under vacuum, such as a vacuum pump and an apparatus for a semiconductor process or a thin film deposition process.SOLUTION: A vacuum device (5) equipped with a vacuum enclosure (17) having a circumferential surface and...

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Bibliographische Detailangaben
Hauptverfasser:	MAXIMILIAN BIRKENFELD, KAMBARA HISANORI, PASCAL WIELSCH
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES LIGHTING MEASURING MECHANICAL ENGINEERING METALLURGY NON-POSITIVE DISPLACEMENT PUMPS PHYSICS POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING WEAPONS
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Beschreibung
Zusammenfassung:	To provide a method for monitoring deposition of by-products in a vacuum device under vacuum, such as a vacuum pump and an apparatus for a semiconductor process or a thin film deposition process.SOLUTION: A vacuum device (5) equipped with a vacuum enclosure (17) having a circumferential surface and an inner volume under vacuum includes at least one induction surface acoustic wave device (18) and a control unit (19). Piezoelectric transducers (20, 21) detect deposition of by-products on the circumferential surface by monitoring fluctuation of at least one parameter of a surface acoustic wave spreading along the circumferential surface of the vacuum enclosure (17). The vacuum device determines the characteristics of the deposition of the by-products.SELECTED DRAWING: Figure 2 【課題】真空ポンプ、及び半導体プロセス又は薄膜堆積プロセスのための装置に関し、真空下に置かれる真空装置内の副生成物の堆積を監視するための方法に関する。【解決手段】円周表面と真空下に置かれる内容積とを有する真空エンクロージャー（１７）を備えた真空装置（５）であって、少なくとも１つの誘導弾性表面波デバイス（１８）と、制御ユニット（１９）とを備えており、前記真空エンクロージャー（１７）の前記円周表面に沿って伝播する弾性表面波の少なくとも１つのパラメータの変動を監視して、前記円周表面への副生成物の堆積を検出する圧電変換器（２０、２１）及び/又は前記副生成物の堆積の特性を決定する真空装置。【選択図】図２