FILM DEPOSITION APPARATUS

To provide a film deposition apparatus capable of forming a functional film on a substrate without deteriorating a property of the functional film.SOLUTION: A film deposition apparatus includes: a film deposition chamber 7 which forms a thin film on a film formation surface side of a substrate 2 transported by roll-to-roll; a guide member 8 which forms a transportation route of the substrate 2 by guiding a transportation direction of the substrate 2 by contacting the film formation surface side of the substrate 2 or its reverse side; and a protective member gluing part 9a which is positioned on a downstream side from the film deposition chamber 7 in the transportation route of the substrate 2 and arranged between the guide member 8a which firstly contacts the film formation surface side of the substrate 2 and the film deposition chamber 7, and glues a protective member B having a flexibility to the film formation surface side of the substrate 2.SELECTED DRAWING: Figure 1 【課題】機能膜の性能を低減させることなく基材に機能膜を形成することができる成膜装置を提供する。【解決手段】ロールトゥロールで搬送される基材２の膜形成面側に薄膜を形成させる成膜チャンバ７と、基材２の膜形成面側もしくはその反対側と接触して基材２の搬送方向を案内することにより基材２の搬送経路を形成する案内部材８と、基材２の搬送経路における成膜チャンバ７より下流側に位置して基材２の膜形成面側と最初に接触する案内部材８ａと成膜チャンバ７との間に設けられ、可撓性を有する保護部材Ｂを基材２の膜形成面側に貼り合わせる保護部材貼り合わせ部９ａと、を備える。【選択図】図１