SiC MATERIAL AND SiC COMPOSITE MATERIAL

To provide an SiC material and an SiC composite material which are stably and evenly etched in a plasma environment.SOLUTION: In the SiC material and the SiC composite material, a diffraction intensity ratio (I) of an X-ray diffraction peak calculated by formula (1) defined by [diffraction intensity...

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1. Verfasser: KIM JOUNG-IL
Format: Patent
Sprache:eng ; jpn
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