SiC MATERIAL AND SiC COMPOSITE MATERIAL

To provide an SiC material and an SiC composite material which are stably and evenly etched in a plasma environment.SOLUTION: In the SiC material and the SiC composite material, a diffraction intensity ratio (I) of an X-ray diffraction peak calculated by formula (1) defined by [diffraction intensity...

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description To provide an SiC material and an SiC composite material which are stably and evenly etched in a plasma environment.SOLUTION: In the SiC material and the SiC composite material, a diffraction intensity ratio (I) of an X-ray diffraction peak calculated by formula (1) defined by [diffraction intensity ratio (I)]={[peak intensity of plane (200)]+[peak intensity of plane (220)]}/[peak intensity of plane (111)] is less than 1.5.SELECTED DRAWING: Figure 1C 【課題】プラズマ環境で安定的で均一にエッチングされるSiC素材及びSiC複合素材の提供。【解決手段】下記の式(1)により算出されるX−回折ピークの回折強度比(I)が1.5未満であるSiC素材及びSiC複合素材を開示する。【選択図】図1C
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subjects ARTIFICIAL STONE
CEMENTS
CERAMICS
CHEMISTRY
COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS
COMPOUNDS THEREOF
CONCRETE
INORGANIC CHEMISTRY
LIME, MAGNESIA
METALLURGY
NON-METALLIC ELEMENTS
REFRACTORIES
SLAG
TREATMENT OF NATURAL STONE
title SiC MATERIAL AND SiC COMPOSITE MATERIAL
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