POSITION DETECTION APPARATUS, POSITION DETECTION METHOD, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

To provide a position detection apparatus for more accurately detecting a pattern having a plurality of pattern elements.SOLUTION: A position detection apparatus 200 for detecting a pattern PT having a plurality of pattern elements formed on an object W includes a control section HP for detect a plu...

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Bibliographische Detailangaben
1. Verfasser:	MURAYAMA GENKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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