POSITION DETECTION APPARATUS, POSITION DETECTION METHOD, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

To provide a position detection apparatus for more accurately detecting a pattern having a plurality of pattern elements.SOLUTION: A position detection apparatus 200 for detecting a pattern PT having a plurality of pattern elements formed on an object W includes a control section HP for detect a plu...

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1. Verfasser:	MURAYAMA GENKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Zusammenfassung:	To provide a position detection apparatus for more accurately detecting a pattern having a plurality of pattern elements.SOLUTION: A position detection apparatus 200 for detecting a pattern PT having a plurality of pattern elements formed on an object W includes a control section HP for detect a plurality of patterns by performing pattern matching using a template TP having a plurality of feature points each corresponding to the plurality of pattern elements. The control section changes positions of the plurality of feature points while performing pattern matching using the template and determines the position of feature points so that a degree of correlation between an image and the template is within a predetermined allowable range.SELECTED DRAWING: Figure 1 【課題】複数のパターン要素を有するパターンをより精度よく検出する位置検出装置を提供する。【解決手段】物体Ｗに形成された、複数のパターン要素を有するパターンＰＴを検出する位置検出装置２００であって、複数のパターン要素のそれぞれに対応する複数の特徴点を有するテンプレートＴＰを用いてパターンマッチングを行い、複数のパターンを検出する制御部ＨＰと、を有し、制御部は、複数の特徴点の位置を変更しながらテンプレートを用いたパターンマッチングを行い、画像とテンプレートとの相関度が予め定めた許容範囲内に収まるように特徴点の位置を決定する。【選択図】図１