EXPOSURE DEVICE

To provide an exposure device capable of improving accuracy and efficiency of exposure treatment.SOLUTION: A peripheral wall member 20 forms a treatment space 20S capable of storing a substrate W and has an upper opening 21. The peripheral wall member 20 has a first gas flow passage 25 for guiding inert gas upward from bottom, and a first opening 27 for making the first gas flow passage 25 and the treatment space 20S communicate with each other. The first opening 27 has a first side face 27a and a second side face 27b facing each other, and a distance between the first side face 27a and the second side face 27b gradually increases toward the treatment space 20S from a downstream end 25b of the first gas flow passage 25. A collision surface 29 with which the inert gas flowing to the first opening 27 from the downstream end 25a of the first gas flow passage 25 collides is provided, and the collision surface 29 is positioned above the substrate W supported by a substrate support mechanism 40 during exposure.SELECTED DRAWING: Figure 1 【課題】露光処理の精度および効率を向上させることが可能な露光装置を提供する。【解決手段】周壁部材２０は基板Ｗを収容可能な処理空間２０Ｓを形成するとともに上部開口２１を有する。また、周壁部材２０は、不活性ガスを下方から上方へ導く第１の気体流路２５と、第１の気体流路２５と処理空間２０Ｓを連通させる第１の開口部２７を有する。第１の開口部２７は、互いに対向する第１の側面２７ａおよび第２の側面２７ｂを有し、第１の側面２７ａおよび第２の側面２７ｂとの間の距離は、第１の気体流路２５の下流端部２５ｂから処理空間２０Ｓにむかって漸次増加する。第１の気体流路２５の下流端部２５ａから第１の開口部２７に流出する不活性ガスが衝突する衝突面２９が設けられ、衝突面２９は、露光時に基板支持機構４０に支持される基板Ｗよりも上方に位置する。【選択図】図１