IMAGING ELEMENT AND IMAGING APPARATUS

To provide an imaging element that can accurately correct dark current irregularities.SOLUTION: In an imaging element, microlenses 400 that focus light are arranged in a matrix consisting of n rows and m columns. An aperture APD (avalanche photodiode) 301 is placed in a light collection area of the...

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Bibliographische Detailangaben
1. Verfasser:	KUMAKI SATOSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PICTORIAL COMMUNICATION, e.g. TELEVISION SEMICONDUCTOR DEVICES
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Zusammenfassung:	To provide an imaging element that can accurately correct dark current irregularities.SOLUTION: In an imaging element, microlenses 400 that focus light are arranged in a matrix consisting of n rows and m columns. An aperture APD (avalanche photodiode) 301 is placed in a light collection area of the microlens 400 as a photoelectric conversion unit. A light-shielding APD 302 is placed in a gap of the aperture APD 301 and outside the light collection area of the microlens 400. A light-shielding layer 401 is placed on an upper side of the light-shielding APD 302.SELECTED DRAWING: Figure 4 【課題】暗電流ムラを精度よく補正可能な撮像素子を提供する。【解決手段】撮像素子には、光を集光するマイクロレンズ４００がｎ行ｍ列からなるマトリクス状に配置されている。マイクロレンズ４００の集光領域内に、光電変換部として開口ＡＰＤ（アバランシェフォトダイオード）３０１が配置されている。開口ＡＰＤ３０１の隙間であって、マイクロレンズ４００の集光領域外に遮光ＡＰＤ３０２が配置される。遮光ＡＰＤ３０２の上側には遮光層４０１が配置される。【選択図】図４