LITHOGRAPHY APPARATUS AND DEVICE-MANUFACTURING METHOD

To provide a system that reduces the occurrence of defects specific to an immersion lithographic apparatus.SOLUTION: A fluid handling structure for a lithographic apparatus includes: an extractor in which a series of first opening portions 300 are formed; a gas knife system in which a series of seco...

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Hauptverfasser:	JOHN MARIA BOMBEECK, KOEN CUYPERS, THEODORUS WILHELMUS POLET, FRANK DEBOUGNOUX, JORGE ALBERTO VIEYRA SALAS, JOHANNES CORNELIS PAULUS MELMAN, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN, GIOVANNI LUCA GATTOBIGIO, HAN HENRICUS ALDEGONDA LEMPENS
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	To provide a system that reduces the occurrence of defects specific to an immersion lithographic apparatus.SOLUTION: A fluid handling structure for a lithographic apparatus includes: an extractor in which a series of first opening portions 300 are formed; a gas knife system in which a series of second opening portions are formed in a radially outward side of the extractor; and at least one further opening portions configured to feed a gas to between the extractor and the gas knife system. The series of first opening portions, the series of second opening portions and the at least one further opening portions are faced with a substrate and/or a support table configured to support the substrate; first subsets of the series of first opening portions, the series of second opening portions and the at least one further opening portions are brought into fluid communication with a first chamber; and second subsets of the series of first opening portions, the series of second opening portions and the at least one further opening portions are brought into fluid communication with a second chamber.SELECTED DRAWING: Figure 4 【課題】液浸リソグラフィ装置に特有の欠陥の発生を低減するシステムを提供する。【解決手段】リソグラフィ装置のための流体ハンドリング構造は、第１の一連の開口部３００が形成されている抽出器と、第２の一連の開口部が抽出器の径方向外側に形成されているガスナイフシステムと、抽出器とガスナイフシステムの間にガスを提供するように構成された少なくとも１つの更なる開口部と、を備える。第１の一連の開口部、第２の一連の開口部、および少なくとも１つの更なる開口部は、基板および／または基板を支持するように構成された支持テーブルに向けられており、第１および第２の一連の開口部および少なくとも１つの更なる開口部の第１サブセットが第１チャンバと流体連絡し、第１および第２の一連の開口部および少なくとも１つの更なる開口部の第２サブセットが第２チャンバと流体連絡している。【選択図】図４