CLEANING METHOD OF ION BEAM IRRADIATION DEVICE

To provide an effective and efficient cleaning method that can reduce and stabilize particles in a beamline at an early stage.SOLUTION: In a cleaning method of an ion beam irradiation device that performs ion beam irradiation processing on an object to be processed using halogen-containing gas, afte...

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Bibliographische Detailangaben
Hauptverfasser:	KUNITACHI KEIICHI, FUJIMOTO RYUGO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	To provide an effective and efficient cleaning method that can reduce and stabilize particles in a beamline at an early stage.SOLUTION: In a cleaning method of an ion beam irradiation device that performs ion beam irradiation processing on an object to be processed using halogen-containing gas, after irradiating the object irradiated with an ion beam derived from hydrogen-containing gas, the irradiated object is irradiated with an ion beam derived from rare gas.SELECTED DRAWING: Figure 3 【課題】ビームライン内のパーティクルを早期に低減し、安定化させることのできる効果的かつ効率的なクリーニングの方法を提案する。【解決手段】ハロゲン含有ガスを用いて被処理物へのイオンビーム照射処理を行うイオンビーム照射装置でのクリーニング手法で、水素含有ガス由来のイオンビームを被照射物へ照射した後、希ガス由来のイオンビームを被照射物へ照射する。【選択図】図３