DEVELOPMENT PROCESSING METHOD AND DEVELOPMENT PROCESSING DEVICE

To reduce the number of defects when a resist film having a large angle of contact to water is formed.SOLUTION: Provided is a development processing method for processing a resist film on a substrate to develop, including: a step (A) for supplying a developer to the substrate to develop the resist f...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ICHINOMIYA HIROSHI, KAI AKIKO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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