RAW MATERIAL GAS SUPPLY SYSTEM AND RAW MATERIAL GAS SUPPLY METHOD

To supply a solid raw material to a raw material gas supply system for supplying a raw material gas formed by evaporating a solid raw material to a processing apparatus in a state without a possibility of adversely affecting on processing in the processing apparatus.SOLUTION: The raw material gas su...

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Bibliographische Detailangaben
Hauptverfasser:	OKURA NARIYUKI, OKABE YASUYUKI, KOMORI EIICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To supply a solid raw material to a raw material gas supply system for supplying a raw material gas formed by evaporating a solid raw material to a processing apparatus in a state without a possibility of adversely affecting on processing in the processing apparatus.SOLUTION: The raw material gas supply system for supplying a raw material gas formed by evaporating a solid raw material to a processing apparatus comprises: an evaporation device for evaporating the solid raw material to form the raw material gas; a delivery mechanism for delivering a solution obtained by dissolving the solid raw material into a solvent to the evaporation device from a solution source storing the solution; and an evaporation mechanism for evaporating the solvent of the solution delivered from the delivery mechanism and stored in the evaporation device to separate the solid raw material.SELECTED DRAWING: Figure 1 【課題】固体原料を気化して生成された原料ガスを処理装置に供給する原料ガス供給システムに、処理装置での処理に悪影響を及ぼすおそれがない形態で固体原料を補給することができるようにする。【解決手段】固体原料を気化して生成された原料ガスを処理装置に供給する原料ガス供給システムであって、前記固体原料を気化して前記原料ガスを生成する気化装置と、前記固体原料が溶媒中に溶解した溶液を貯留する溶液源から前記気化装置へ前記溶液を送出する送出機構と、前記送出機構から送出され前記気化装置内に収容された前記溶液の溶媒を蒸発させ前記固体原料を分離する蒸発機構と、を備える。【選択図】図１