METHOD FOR PRODUCING COMPLEX HAVING METAL FILM FORMED ON BASE MATERIAL, AND COMPLEX

To provide a method for forming a metal film having excellent peeling resistance on a base material conveniently, and a complex having the metal film on its surface.SOLUTION: A method for producing a complex having a metal film formed on a base material includes the step of: applying a metal chelate...

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Hauptverfasser: NAKAMURA ATSUSHI, DAN ENKIN, GUO CHENYU, NANBU NOBUYOSHI, NANBU TADAHIKO, KOMATSU KEIJI, SAITO HIDETOSHI, KUDO TAKUYA
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a method for forming a metal film having excellent peeling resistance on a base material conveniently, and a complex having the metal film on its surface.SOLUTION: A method for producing a complex having a metal film formed on a base material includes the step of: applying a metal chelate complex solution containing a metal component with smaller ionization tendency than that of Cd, and a chelator to the base material; and heating a portion of the base material to which the metal chelate complex solution has been applied. Preferably, the metal chelate complex solution further contains a surfactant, the base material is a cement hardened body, and the metal component is Cu or Ni.SELECTED DRAWING: Figure 1 【課題】剥離耐性に優れた金属膜を基材上に簡便に形成する方法、及び該金属膜を表面に有する複合体を提供する。【解決手段】基材上に金属膜が形成された複合体を製造するための方法は、Cdよりイオン化傾向が小さい金属成分とキレート剤とを含む金属キレート錯体溶液を前記基材に塗布する工程、および、前記基材の前記金属キレート錯体溶液を塗布した部分を熱処理する工程を含むことを特徴とする。好ましくは、前記金属キレート錯体溶液が更に界面活性剤を含み、前記基材がセメント硬化体であり、前記金属成分がCuまたはNiである。【選択図】図1