EXHAUST SYSTEM AND CABLE COVER OF PROCESSING CHAMBER DEVICE
To provide an exhaust system of a device installed in a processing chamber in a single-wafer processing of a substrate.SOLUTION: An exhaust system of a processing chamber device includes a device 20 used in a processing chamber 10 that processes a substrate W, a power supply 61 or a controller 60 in...
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| Format: | Patent |
| Sprache: | eng ; jpn |
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| Zusammenfassung: | To provide an exhaust system of a device installed in a processing chamber in a single-wafer processing of a substrate.SOLUTION: An exhaust system of a processing chamber device includes a device 20 used in a processing chamber 10 that processes a substrate W, a power supply 61 or a controller 60 installed outside the processing chamber and connected to the device, a cable 71 that connects the device to the power supply or the controller, and a chemical resistant cable cover 70 that covers at least a portion of the cable in the processing chamber, and the cable cover is an exhaust path for exhausting gas in the device to the outside of the processing chamber.SELECTED DRAWING: Figure 9
【課題】基板の枚葉式処理において、処理室内に設置される装置の排気システムを提供する。【解決手段】基板Ｗを処理する処理室１０内で使用する装置２０と、前記処理室外に設置され、前記装置に接続される電源６１または制御器６０と、前記装置と前記電源または前記制御器とを接続するケーブル７１と、前記ケーブルの少なくとも前記処理室内にある部分をカバーする耐薬品性のケーブルカバー７０とを備え、前記ケーブルカバーは、前記装置内の気体を前記処理室外へ排気する排気路である処理室内装置の排気システム。【選択図】図９ |
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