DEPOSITION-PREVENTING MECHANISM, AND FILM DEPOSITION APPARATUS

To provide a deposition-preventing mechanism that can suppress the generation of particles caused by deposition matter, and a film deposition apparatus.SOLUTION: A deposition-preventing mechanism 10 comprises: a first roller 11; a second roller 12; a deposition-preventing sheet 13 that includes a de...

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Bibliographische Detailangaben
Hauptverfasser:	AOSHIRO MAKOTO, YAMADA RYUZO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a deposition-preventing mechanism that can suppress the generation of particles caused by deposition matter, and a film deposition apparatus.SOLUTION: A deposition-preventing mechanism 10 comprises: a first roller 11; a second roller 12; a deposition-preventing sheet 13 that includes a deposition surface 13S to face a film deposition source DS while being conveyed from the first roller 11 to the second roller 12, and is wound around the second roller 12; and a recovery part 14 that is positioned in the vertical direction of the second roller 12 and recovers deposition matter DF peeled from the deposition surface 13S.SELECTED DRAWING: Figure 1 【課題】着膜物に起因したパーティクルの発生を抑えることを可能とした防着機構、および、成膜装置を提供する。【解決手段】防着機構１０は、第１ローラー１１と、第２ローラー１２と、第１ローラー１１から第２ローラー１２に向けて搬送される途中で成膜源ＤＳと対向する被着面１３Ｓを有し、第２ローラー１２に巻き取られる防着シート１３と、第２ローラー１２の鉛直方向に位置し、被着面１３Ｓから剥がれる着膜物ＤＦを回収する回収部１４とを備える。【選択図】図１