WAFER TRANSFER SYSTEM

To provide a wafer transfer system capable of preventing foreign matter from adhering to a wafer during transporting the wafer.SOLUTION: A wafer transfer system 10 includes: a robot (conveyance mechanism) 20 that conveys wafer 1; a clean chamber 30; and a fan (first blower mechanism) 40 that forms a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: OTSUKI TAKAYUKI
Format: Patent
Sprache:eng ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator OTSUKI TAKAYUKI
description To provide a wafer transfer system capable of preventing foreign matter from adhering to a wafer during transporting the wafer.SOLUTION: A wafer transfer system 10 includes: a robot (conveyance mechanism) 20 that conveys wafer 1; a clean chamber 30; and a fan (first blower mechanism) 40 that forms an airflow from the ceiling 31 to the bottom 32 of the clean chamber 30. The robot 20 includes: a hand unit 22 that holds a wafer 1; a fan (second blower mechanism) 70 that, when the hand unit 22 holds the wafer 1, forms an airflow from the bottom surface 1b side of the wafer 1 to the bottom 32 of the clean chamber 30; and a control unit that controls the drive state of the fan 70 depending on the presence or absence of the wafer 1 held by the hand unit 22.SELECTED DRAWING: Figure 3 【課題】ウエハを搬送する際、ウエハへの異物の付着を防止する。【解決手段】ウエハ搬送装置10は、ウエハ1を搬送するロボット(搬送機構部)20と、クリーン室30と、クリーン室30の天井部31から底部32側に向かう気流を形成するファン(第1送風機構部)40と、を有する。ロボット20は、ウエハ1を保持するハンド部22と、ハンド部22がウエハ1を保持した状態の時、ウエハ1の下面1b側からクリーン室30の底部32に向かう気流を形成するファン(第2送風機構部)70と、ハンド部22によるウエハ1の保持の有無に応じて、ファン70の駆動状態を制御する制御部と、を備える。【選択図】図3
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2020205299A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2020205299A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2020205299A3</originalsourceid><addsrcrecordid>eNrjZBANd3RzDVIICXL0CwYxgiODQ1x9eRhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkQEImhpZWjoaE6UIAN4FH20</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>WAFER TRANSFER SYSTEM</title><source>esp@cenet</source><creator>OTSUKI TAKAYUKI</creator><creatorcontrib>OTSUKI TAKAYUKI</creatorcontrib><description>To provide a wafer transfer system capable of preventing foreign matter from adhering to a wafer during transporting the wafer.SOLUTION: A wafer transfer system 10 includes: a robot (conveyance mechanism) 20 that conveys wafer 1; a clean chamber 30; and a fan (first blower mechanism) 40 that forms an airflow from the ceiling 31 to the bottom 32 of the clean chamber 30. The robot 20 includes: a hand unit 22 that holds a wafer 1; a fan (second blower mechanism) 70 that, when the hand unit 22 holds the wafer 1, forms an airflow from the bottom surface 1b side of the wafer 1 to the bottom 32 of the clean chamber 30; and a control unit that controls the drive state of the fan 70 depending on the presence or absence of the wafer 1 held by the hand unit 22.SELECTED DRAWING: Figure 3 【課題】ウエハを搬送する際、ウエハへの異物の付着を防止する。【解決手段】ウエハ搬送装置10は、ウエハ1を搬送するロボット(搬送機構部)20と、クリーン室30と、クリーン室30の天井部31から底部32側に向かう気流を形成するファン(第1送風機構部)40と、を有する。ロボット20は、ウエハ1を保持するハンド部22と、ハンド部22がウエハ1を保持した状態の時、ウエハ1の下面1b側からクリーン室30の底部32に向かう気流を形成するファン(第2送風機構部)70と、ハンド部22によるウエハ1の保持の有無に応じて、ファン70の駆動状態を制御する制御部と、を備える。【選択図】図3</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; CONVEYING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HANDLING THIN OR FILAMENTARY MATERIAL ; PACKING ; PERFORMING OPERATIONS ; PNEUMATIC TUBE CONVEYORS ; SEMICONDUCTOR DEVICES ; SHOP CONVEYOR SYSTEMS ; STORING ; TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201224&amp;DB=EPODOC&amp;CC=JP&amp;NR=2020205299A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201224&amp;DB=EPODOC&amp;CC=JP&amp;NR=2020205299A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OTSUKI TAKAYUKI</creatorcontrib><title>WAFER TRANSFER SYSTEM</title><description>To provide a wafer transfer system capable of preventing foreign matter from adhering to a wafer during transporting the wafer.SOLUTION: A wafer transfer system 10 includes: a robot (conveyance mechanism) 20 that conveys wafer 1; a clean chamber 30; and a fan (first blower mechanism) 40 that forms an airflow from the ceiling 31 to the bottom 32 of the clean chamber 30. The robot 20 includes: a hand unit 22 that holds a wafer 1; a fan (second blower mechanism) 70 that, when the hand unit 22 holds the wafer 1, forms an airflow from the bottom surface 1b side of the wafer 1 to the bottom 32 of the clean chamber 30; and a control unit that controls the drive state of the fan 70 depending on the presence or absence of the wafer 1 held by the hand unit 22.SELECTED DRAWING: Figure 3 【課題】ウエハを搬送する際、ウエハへの異物の付着を防止する。【解決手段】ウエハ搬送装置10は、ウエハ1を搬送するロボット(搬送機構部)20と、クリーン室30と、クリーン室30の天井部31から底部32側に向かう気流を形成するファン(第1送風機構部)40と、を有する。ロボット20は、ウエハ1を保持するハンド部22と、ハンド部22がウエハ1を保持した状態の時、ウエハ1の下面1b側からクリーン室30の底部32に向かう気流を形成するファン(第2送風機構部)70と、ハンド部22によるウエハ1の保持の有無に応じて、ファン70の駆動状態を制御する制御部と、を備える。【選択図】図3</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CONVEYING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HANDLING THIN OR FILAMENTARY MATERIAL</subject><subject>PACKING</subject><subject>PERFORMING OPERATIONS</subject><subject>PNEUMATIC TUBE CONVEYORS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SHOP CONVEYOR SYSTEMS</subject><subject>STORING</subject><subject>TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBANd3RzDVIICXL0CwYxgiODQ1x9eRhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkQEImhpZWjoaE6UIAN4FH20</recordid><startdate>20201224</startdate><enddate>20201224</enddate><creator>OTSUKI TAKAYUKI</creator><scope>EVB</scope></search><sort><creationdate>20201224</creationdate><title>WAFER TRANSFER SYSTEM</title><author>OTSUKI TAKAYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2020205299A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CONVEYING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HANDLING THIN OR FILAMENTARY MATERIAL</topic><topic>PACKING</topic><topic>PERFORMING OPERATIONS</topic><topic>PNEUMATIC TUBE CONVEYORS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SHOP CONVEYOR SYSTEMS</topic><topic>STORING</topic><topic>TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>OTSUKI TAKAYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OTSUKI TAKAYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>WAFER TRANSFER SYSTEM</title><date>2020-12-24</date><risdate>2020</risdate><abstract>To provide a wafer transfer system capable of preventing foreign matter from adhering to a wafer during transporting the wafer.SOLUTION: A wafer transfer system 10 includes: a robot (conveyance mechanism) 20 that conveys wafer 1; a clean chamber 30; and a fan (first blower mechanism) 40 that forms an airflow from the ceiling 31 to the bottom 32 of the clean chamber 30. The robot 20 includes: a hand unit 22 that holds a wafer 1; a fan (second blower mechanism) 70 that, when the hand unit 22 holds the wafer 1, forms an airflow from the bottom surface 1b side of the wafer 1 to the bottom 32 of the clean chamber 30; and a control unit that controls the drive state of the fan 70 depending on the presence or absence of the wafer 1 held by the hand unit 22.SELECTED DRAWING: Figure 3 【課題】ウエハを搬送する際、ウエハへの異物の付着を防止する。【解決手段】ウエハ搬送装置10は、ウエハ1を搬送するロボット(搬送機構部)20と、クリーン室30と、クリーン室30の天井部31から底部32側に向かう気流を形成するファン(第1送風機構部)40と、を有する。ロボット20は、ウエハ1を保持するハンド部22と、ハンド部22がウエハ1を保持した状態の時、ウエハ1の下面1b側からクリーン室30の底部32に向かう気流を形成するファン(第2送風機構部)70と、ハンド部22によるウエハ1の保持の有無に応じて、ファン70の駆動状態を制御する制御部と、を備える。【選択図】図3</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; jpn
recordid cdi_epo_espacenet_JP2020205299A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
CONVEYING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
HANDLING THIN OR FILAMENTARY MATERIAL
PACKING
PERFORMING OPERATIONS
PNEUMATIC TUBE CONVEYORS
SEMICONDUCTOR DEVICES
SHOP CONVEYOR SYSTEMS
STORING
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING
TRANSPORTING
title WAFER TRANSFER SYSTEM
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T22%3A12%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OTSUKI%20TAKAYUKI&rft.date=2020-12-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2020205299A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true