PATTERN MEASUREMENT DEVICE, INCLINATION CALCULATION METHOD AND PATTERN MEASUREMENT METHOD FOR PATTERN MEASUREMENT DEVICE

To provide a technology that can measure the pattern shape with high accuracy.SOLUTION: A pattern measuring device according to the embodiment includes a transport unit, a pattern projection unit, an imaging unit, and a measuring unit. The transport unit transports a substrate. The pattern projectio...

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Bibliographische Detailangaben
Hauptverfasser:	FUJIWARA SHIN, ONOE KOTARO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES TESTING
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