PATTERN MEASUREMENT DEVICE, INCLINATION CALCULATION METHOD AND PATTERN MEASUREMENT METHOD FOR PATTERN MEASUREMENT DEVICE

To provide a technology that can measure the pattern shape with high accuracy.SOLUTION: A pattern measuring device according to the embodiment includes a transport unit, a pattern projection unit, an imaging unit, and a measuring unit. The transport unit transports a substrate. The pattern projectio...

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Bibliographische Detailangaben
Hauptverfasser:	FUJIWARA SHIN, ONOE KOTARO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	To provide a technology that can measure the pattern shape with high accuracy.SOLUTION: A pattern measuring device according to the embodiment includes a transport unit, a pattern projection unit, an imaging unit, and a measuring unit. The transport unit transports a substrate. The pattern projection unit is arranged above the transport unit and projects a projection pattern onto the substrate transported by the transport unit. The imaging unit is arranged above the transport unit and images a projection pattern projected on the substrate or an actual pattern formed on the substrate. The measuring unit measures the shape of the projection pattern or the actual pattern based on the image captured by the imaging unit.SELECTED DRAWING: Figure 4 【課題】パターン形状を精度よく測定することができる技術を提供すること。【解決手段】実施形態に係るパターン測定装置は、搬送部と、パターン投影部と、撮像部と、測定部とを備える。搬送部は、基板を搬送する。パターン投影部は、搬送部の上方に配置され、搬送部によって搬送される基板に投影パターンを投影する。撮像部は、搬送部の上方に配置され、基板に投影された投影パターンまたは基板に形成された実パターンを撮像する。測定部は、撮像部によって撮像された画像に基づき、投影パターンまたは実パターンの形状を測定する。【選択図】図４