IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

To provide an imprint device capable of shortening a filling time of a resist material to a recess of a template and improving productivity by suppressing occurrence of an unfilled defect, an imprint method, and a method for manufacturing a semiconductor device.SOLUTION: An imprint device 1000 compr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MUTO DAIZO, KOBAYASHI TAKASHI, KATO HIROKAZU, OKABE KASUMI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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