IMPRINT DEVICE, IMPRINT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

To provide an imprint device capable of shortening a filling time of a resist material to a recess of a template and improving productivity by suppressing occurrence of an unfilled defect, an imprint method, and a method for manufacturing a semiconductor device.SOLUTION: An imprint device 1000 compr...

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Bibliographische Detailangaben
Hauptverfasser:	MUTO DAIZO, KOBAYASHI TAKASHI, KATO HIROKAZU, OKABE KASUMI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	To provide an imprint device capable of shortening a filling time of a resist material to a recess of a template and improving productivity by suppressing occurrence of an unfilled defect, an imprint method, and a method for manufacturing a semiconductor device.SOLUTION: An imprint device 1000 comprises an information acquisition unit 110 which acquires information of a film formed on a substrate. The imprint device also comprises a primer forming unit which acquires a primer forming condition determined on the basis of the information, and forms the primer for the substrate. Furthermore, the imprint device comprises an imprint unit 600 which subjects the substrate in which the primer is formed to imprint lithography.SELECTED DRAWING: Figure 1 【課題】テンプレートの凹部に対するレジスト材料の充填時間を短縮し、未充填欠陥の発生を抑えることで、生産性を向上したインプリント装置、インプリント方法、及び半導体装置の製造方法を提供する。【解決手段】インプリント装置１０００は、基板上に形成された膜の情報を取得する情報取得部１１０を備える。また、情報に基づいて決定されたプライマー形成条件を取得し、基板に対してプライマーの形成を行うプライマー形成部を備える。さらに、プライマーが形成された基板にインプリントリソグラフィを行うインプリント部６００を備える。【選択図】図１