SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, AND METHOD OF OPERATING LITHOGRAPHIC APPARATUS

To provide a method of reducing the possibility of droplets of immersion liquid being deposited on a surface of an object when a liquid confinement structure moves across the surface of the object in an immersion lithographic apparatus.SOLUTION: A substrate table configured to support a substrate (W...

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Hauptverfasser:	JOSEPHUS PETER VAN LIESHOUT, WALTER THEODORUS MATHEUS STALS, ALEXANDER NIKOLOV ZDRAVKOV, VAN SOMMEREN DAAN DANIEL JOHANNES ANTONIUS, THEODORUS WILHELMUS POLET, COEN HUBERTUS MATHEUS BALTIS, JORGE ALVERTO VIEYRA SALA, HAROLD SEBASTIAAN BUDDENBERG, YURI JOHANNES GABRIE VAN DE VIJVER, JOHANNES CORNELIS PAULUS MELMAN, GIOVANNI LUCA GATTOBIGIO, GUENES NAKIBOGLU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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