SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, AND METHOD OF OPERATING LITHOGRAPHIC APPARATUS

To provide a method of reducing the possibility of droplets of immersion liquid being deposited on a surface of an object when a liquid confinement structure moves across the surface of the object in an immersion lithographic apparatus.SOLUTION: A substrate table configured to support a substrate (W...

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Hauptverfasser:	JOSEPHUS PETER VAN LIESHOUT, WALTER THEODORUS MATHEUS STALS, ALEXANDER NIKOLOV ZDRAVKOV, VAN SOMMEREN DAAN DANIEL JOHANNES ANTONIUS, THEODORUS WILHELMUS POLET, COEN HUBERTUS MATHEUS BALTIS, JORGE ALVERTO VIEYRA SALA, HAROLD SEBASTIAAN BUDDENBERG, YURI JOHANNES GABRIE VAN DE VIJVER, JOHANNES CORNELIS PAULUS MELMAN, GIOVANNI LUCA GATTOBIGIO, GUENES NAKIBOGLU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	To provide a method of reducing the possibility of droplets of immersion liquid being deposited on a surface of an object when a liquid confinement structure moves across the surface of the object in an immersion lithographic apparatus.SOLUTION: A substrate table configured to support a substrate (W) for exposure in an immersion lithographic apparatus includes: a support body having a support surface configured to support the substrate; and a cover ring (130) fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, where the cover ring has an upper surface (60), where at least a portion (61) of the upper surface is configured to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.SELECTED DRAWING: Figure 5 【課題】液浸リソグラフィ装置で液体閉じ込め構造がオブジェクトの表面を移動するときに液浸液の液滴がオブジェクトの表面に付着する可能性を低下させる方法を提供する。【解決手段】液浸リソグラフィ装置において露光用基板（Ｗ）を支持するように構成された基板テーブルであって、基板テーブルは、基板を支持するように構成された支持面を有する支持体と、支持体に対して固定され、支持面に支持された基板を平面視で取り囲むように構成されたカバーリング（１３０）とを備え、カバーリングは上面（６０）を有し、上面の少なくとも一部分（６１）は、基板に向かって上面に沿って移動するとき、液浸液のメニスカスの安定性を変化させるように構成された基板テーブル。【選択図】図５