METHOD FOR PRODUCING COPPER POWDER

To provide a copper powder having a high single crystallinity, a small particle diameter and a small distribution of particle diameters and to provide a device and method for stably producing the copper powder.SOLUTION: There is provided a copper powder comprising a plurality of copper particles. Th...

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Hauptverfasser: KOBAYASHI RYOTA, ROKKAKU KOSUKE, YOSHIDA MITSUGI, ASAI TAKESHI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a copper powder having a high single crystallinity, a small particle diameter and a small distribution of particle diameters and to provide a device and method for stably producing the copper powder.SOLUTION: There is provided a copper powder comprising a plurality of copper particles. The particle diameter D50 when the cumulative frequency in the particle diameter histogram on a volume basis of a plurality of copper particles reaches 50% is 100 nm or more and 500 nm or less, the ratio of the average crystallite diameter D of the plurality of copper particles to D50 is 0.10 or more and 0.50 or less. In addition, the copper powder may have a span S represented by the following formula of 0.5 or more and 1.5 or less. Here, D90 and D10 are a particle diameter when the cumulative frequency in the particle diameter histogram on a volume basis of the copper particles reaches 90% and 10%, respectively.SELECTED DRAWING: Figure 2 【課題】単結晶性が高く、粒子径とその分布が小さい銅粉体、およびこの銅粉体を安定的に製造するための装置と方法を提供する。【解決手段】複数の銅粒子を含む銅粉体が提供される。複数の銅粒子の体積基準の粒子径ヒストグラムにおける累積頻度が50%になるときの粒子径D50は100nm以上500nm以下であり、D50に対する複数の銅粒子の平均結晶子径Dの比は0.10以上0.50以下である。また、銅粉体は以下の式で表されるスパンSが0.5以上1.5以下であってもよい。ここで、D90とD10はそれぞれ、前記銅粒子の体積基準の粒子径ヒストグラムにおける累積頻度が90%と10%になるときの粒子径である。【数1】【選択図】図2