SCANNING ELECTRON MICROSCOPY APPARATUS AND METHOD

To provide a system for imaging a sample through a protective pellicle.SOLUTION: A system 100 includes an electron beam source 102 configured to generate an electron beam, and a sample stage 111 configured to secure a sample and a pellicle, where the pellicle is disposed above the sample. The system...

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Bibliographische Detailangaben
Hauptverfasser:	WILLIAM G SCHULTZ, GILDARDO DELGADO, GARRY A ROSE
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	To provide a system for imaging a sample through a protective pellicle.SOLUTION: A system 100 includes an electron beam source 102 configured to generate an electron beam, and a sample stage 111 configured to secure a sample and a pellicle, where the pellicle is disposed above the sample. The system 100 also includes an electron-optical column 106 including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle onto a portion of the sample. In addition, the system 100 includes a detector assembly 112 positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.SELECTED DRAWING: Figure 1A 【課題】保護ペリクルを通してサンプルを描画するシステムを提供する。【解決手段】本システム１００は電子ビームを生成すべく構成された電子ビーム源１０２と、サンプルとペリクルを固定すべく構成され、ペリクルがサンプルの上方に配置されているサンプル台１１１を含んでいる。本システム１００はまた、電子ビームの少なくとも一部をペリクルを通してサンプルの一部の上に誘導する電子光学素子の組を含む電子光学カラム１０６を含んでいる。また、本システム１００は、ペリクルの上方に配置され、且つサンプルの表面から発せられた電子を検出すべく構成された検出器アセンブリ１１２を含んでいる。【選択図】図１Ａ