DILUTE CHEMICAL LIQUID PRODUCTION DEVICE

To provide a dilute chemical liquid production device capable of stably producing a dilute chemical liquid having extremely low concentration of acid, alkali and the like with a simple structure.SOLUTION: A dilute chemical liquid production device 1 has a plunger pump and a chemical liquid supply pi...

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Hauptverfasser:	OGAWA YUICHI, SUGITA WATARU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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creator	OGAWA YUICHI SUGITA WATARU
description	To provide a dilute chemical liquid production device capable of stably producing a dilute chemical liquid having extremely low concentration of acid, alkali and the like with a simple structure.SOLUTION: A dilute chemical liquid production device 1 has a plunger pump and a chemical liquid supply pipe 3 supplying a chemical liquid S from a chemical liquid storage tank. The terminal of the chemical liquid supply pipe 3 is an injection point 11 of the chemical liquid S. The chemical liquid supply pipe 3 is inserted into an approximately central portion of an ultrapure water flow passage 12 being a first piping in a radial direction via a bore through joint 13. A conductivity meter 14 is disposed as conductivity measurement means on the downstream side of the bore through joint 13 becoming the injection point 11, and connected with control means (not illustrated). A plunger pump 4 can be controlled corresponding to a measured value of the conductivity meter 14.SELECTED DRAWING: Figure 2 【課題】簡単な構造で酸・アルカリ等の極めて低濃度の希薄薬液を安定的に製造することの可能な希薄薬液製造装置を提供する。【解決手段】希薄薬液製造装置１は、薬液貯槽から薬液Ｓを供給するプランジャポンプと薬液供給管３とを有する。薬液供給管３の末端は薬液Ｓの注入点１１となっている。この薬液供給管３は、ボアスルー継手１３を介して第１の配管である超純水流路１２の径方向の略中央にまで挿入されている。そして、注入点１１となるボアスルー継手１３より下流側には、導電率計測手段としての導電率計１４が設けられていて、前述した制御手段（図示せず）に接続しており、導電率計１４の測定値に応じてプランジャポンプ４を制御可能となっている。【選択図】図２
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The terminal of the chemical liquid supply pipe 3 is an injection point 11 of the chemical liquid S. The chemical liquid supply pipe 3 is inserted into an approximately central portion of an ultrapure water flow passage 12 being a first piping in a radial direction via a bore through joint 13. A conductivity meter 14 is disposed as conductivity measurement means on the downstream side of the bore through joint 13 becoming the injection point 11, and connected with control means (not illustrated). A plunger pump 4 can be controlled corresponding to a measured value of the conductivity meter 14.SELECTED DRAWING: Figure 2 【課題】簡単な構造で酸・アルカリ等の極めて低濃度の希薄薬液を安定的に製造することの可能な希薄薬液製造装置を提供する。【解決手段】希薄薬液製造装置１は、薬液貯槽から薬液Ｓを供給するプランジャポンプと薬液供給管３とを有する。薬液供給管３の末端は薬液Ｓの注入点１１となっている。この薬液供給管３は、ボアスルー継手１３を介して第１の配管である超純水流路１２の径方向の略中央にまで挿入されている。そして、注入点１１となるボアスルー継手１３より下流側には、導電率計測手段としての導電率計１４が設けられていて、前述した制御手段（図示せず）に接続しており、導電率計１４の測定値に応じてプランジャポンプ４を制御可能となっている。【選択図】図２</description><language>eng ; jpn</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201008&DB=EPODOC&CC=JP&NR=2020163245A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201008&DB=EPODOC&CC=JP&NR=2020163245A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OGAWA YUICHI</creatorcontrib><creatorcontrib>SUGITA WATARU</creatorcontrib><title>DILUTE CHEMICAL LIQUID PRODUCTION DEVICE</title><description>To provide a dilute chemical liquid production device capable of stably producing a dilute chemical liquid having extremely low concentration of acid, alkali and the like with a simple structure.SOLUTION: A dilute chemical liquid production device 1 has a plunger pump and a chemical liquid supply pipe 3 supplying a chemical liquid S from a chemical liquid storage tank. The terminal of the chemical liquid supply pipe 3 is an injection point 11 of the chemical liquid S. The chemical liquid supply pipe 3 is inserted into an approximately central portion of an ultrapure water flow passage 12 being a first piping in a radial direction via a bore through joint 13. A conductivity meter 14 is disposed as conductivity measurement means on the downstream side of the bore through joint 13 becoming the injection point 11, and connected with control means (not illustrated). A plunger pump 4 can be controlled corresponding to a measured value of the conductivity meter 14.SELECTED DRAWING: Figure 2 【課題】簡単な構造で酸・アルカリ等の極めて低濃度の希薄薬液を安定的に製造することの可能な希薄薬液製造装置を提供する。【解決手段】希薄薬液製造装置１は、薬液貯槽から薬液Ｓを供給するプランジャポンプと薬液供給管３とを有する。薬液供給管３の末端は薬液Ｓの注入点１１となっている。この薬液供給管３は、ボアスルー継手１３を介して第１の配管である超純水流路１２の径方向の略中央にまで挿入されている。そして、注入点１１となるボアスルー継手１３より下流側には、導電率計測手段としての導電率計１４が設けられていて、前述した制御手段（図示せず）に接続しており、導電率計１４の測定値に応じてプランジャポンプ４を制御可能となっている。【選択図】図２</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBw8fQJDXFVcPZw9fV0dvRR8PEMDPV0UQgI8ncJdQ7x9PdTcHEN83R25WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgZGBoZmxkYmpo7GRCkCAEmlJHE</recordid><startdate>20201008</startdate><enddate>20201008</enddate><creator>OGAWA YUICHI</creator><creator>SUGITA WATARU</creator><scope>EVB</scope></search><sort><creationdate>20201008</creationdate><title>DILUTE CHEMICAL LIQUID PRODUCTION DEVICE</title><author>OGAWA YUICHI ; SUGITA WATARU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2020163245A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>OGAWA YUICHI</creatorcontrib><creatorcontrib>SUGITA WATARU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OGAWA YUICHI</au><au>SUGITA WATARU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DILUTE CHEMICAL LIQUID PRODUCTION DEVICE</title><date>2020-10-08</date><risdate>2020</risdate><abstract>To provide a dilute chemical liquid production device capable of stably producing a dilute chemical liquid having extremely low concentration of acid, alkali and the like with a simple structure.SOLUTION: A dilute chemical liquid production device 1 has a plunger pump and a chemical liquid supply pipe 3 supplying a chemical liquid S from a chemical liquid storage tank. The terminal of the chemical liquid supply pipe 3 is an injection point 11 of the chemical liquid S. The chemical liquid supply pipe 3 is inserted into an approximately central portion of an ultrapure water flow passage 12 being a first piping in a radial direction via a bore through joint 13. A conductivity meter 14 is disposed as conductivity measurement means on the downstream side of the bore through joint 13 becoming the injection point 11, and connected with control means (not illustrated). A plunger pump 4 can be controlled corresponding to a measured value of the conductivity meter 14.SELECTED DRAWING: Figure 2 【課題】簡単な構造で酸・アルカリ等の極めて低濃度の希薄薬液を安定的に製造することの可能な希薄薬液製造装置を提供する。【解決手段】希薄薬液製造装置１は、薬液貯槽から薬液Ｓを供給するプランジャポンプと薬液供給管３とを有する。薬液供給管３の末端は薬液Ｓの注入点１１となっている。この薬液供給管３は、ボアスルー継手１３を介して第１の配管である超純水流路１２の径方向の略中央にまで挿入されている。そして、注入点１１となるボアスルー継手１３より下流側には、導電率計測手段としての導電率計１４が設けられていて、前述した制御手段（図示せず）に接続しており、導電率計１４の測定値に応じてプランジャポンプ４を制御可能となっている。【選択図】図２</abstract><oa>free_for_read</oa></addata></record>
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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
title	DILUTE CHEMICAL LIQUID PRODUCTION DEVICE
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