ELECTRONIC COMPONENT BUILT-IN CIRCUIT BOARD AND MANUFACTURING METHOD THEREOF

To improve accuracy of image recognition performed when an electronic component is mounted on the surface of an isolating layer, by increasing contrast of an alignment mark.SOLUTION: An electronic component build-in circuit board 100 includes: a conductor layer L3 provided on a surface of an isolati...

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Bibliographische Detailangaben
Hauptverfasser: SUZUKI YOSHIHIRO, OKAWA HIROSHIGE, AOKI TAKURO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To improve accuracy of image recognition performed when an electronic component is mounted on the surface of an isolating layer, by increasing contrast of an alignment mark.SOLUTION: An electronic component build-in circuit board 100 includes: a conductor layer L3 provided on a surface of an isolating layer 111, and having an opening A for exposing the surface of the isolating layer 111; an isolating layer 112 covering the surface of the isolating layer 111 via the conductor layer L3; an electronic component 130 mounted on a surface of the isolating layer 112; and an isolating layer 113 provided on the surface of the isolating layer 112, and covering the electronic component 130. The isolating layer 112 has a light transmittance higher than that of the isolating layer 111, and the isolating layer 111 has a light reflectance lower than that of the isolating layer 112. Since the light transmittance of the isolating layer 112 is higher, the alignment mark can be recognized easily via the isolating layer 112. Furthermore, since the light reflectance of the isolating layer 111 used as a base of the alignment mark, is lower, high contrast can be obtained.SELECTED DRAWING: Figure 1 【課題】アライメントマークのコントラストを高めることによって、絶縁層の表面に電子部品を搭載する際の画像認識精度を高める。【解決手段】電子部品内蔵回路基板100は、絶縁層111の表面に設けられ、絶縁層111の表面を露出させる開口部Aを有する導体層L3と、導体層L3を介して絶縁層111の表面を覆う絶縁層112と、絶縁層112の表面に搭載された電子部品130と、絶縁層112の表面上に設けられ、電子部品130を覆う絶縁層113とを備える。絶縁層112は絶縁層111よりも光の透過率が高く、絶縁層111は絶縁層112よりも光の反射率が低い。このように、絶縁層112の光透過率が高いことから、絶縁層112を介してアライメントマークを認識しやすくなる。しかも、アライメントマークの下地となる絶縁層111の光反射率が低いことから、高いコントラストを得ることが可能となる。【選択図】図1