CATHODE UNIT FOR MAGNETRON SPUTTERING DEVICE, AND FILM DEPOSITION METHOD

To provide a cathode unit for a magnetron sputtering device capable of freely changing an action region of a stray magnetic field to a target surface, and uniformly eroding a sputtering face across its almost entire surface, and a film deposition method.SOLUTION: A cathode unit CU for a magnetron sp...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	OKUBO HIROO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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