METHOD OF MANUFACTURING METAL PARTICLE-CONTAINING BASE MATERIAL, AND METAL PARTICLE-CONTAINING BASE MATERIAL

To provide a carrier which is usable for high-sensitivity Raman scattering analysis.SOLUTION: The problem to be solved can be solved by a method of manufacturing a metal particle-containing base material comprising metal particles on a surface of a base material, the method comprising the processes...

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Bibliographische Detailangaben
Hauptverfasser:	IKOMA TOSHIYUKI, TORII YOSHITANE, KYOMOTO MASAYUKI, SASAKI SHUN
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY PERFORMING OPERATIONS POWDER METALLURGY SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING WORKING METALLIC POWDER
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Beschreibung
Zusammenfassung:	To provide a carrier which is usable for high-sensitivity Raman scattering analysis.SOLUTION: The problem to be solved can be solved by a method of manufacturing a metal particle-containing base material comprising metal particles on a surface of a base material, the method comprising the processes of (1) sticking a reducer on the base material; (2) dipping the base material having the reducer stuck in a solution including a metal complex of the metal particles to deposit metal particles on the base material; (3) sticking the reducer on the base material having the metal particles deposited; and (4) dipping the base material having the metal particles deposited and the reducer stuck in the solution including the metal complex of the metal particles to deposit or grow metal particles on the base material.SELECTED DRAWING: None 【課題】本発明の目的は、高感度なラマン散乱分光分析に用いることのできる担体を提供することである。【解決手段】前記課題は、本発明の支持体の表面に金属粒子を有する金属粒子含有支持体の製造方法であって、前記製造方法が、（１）支持体に還元剤を付着させる工程と、（２）前記還元剤が付着した支持体を、金属粒子の金属錯体を含む水溶液に浸漬し、支持体に金属粒子を析出させる工程と、（３）前記金属粒子が析出した支持体に還元剤を付着させる工程と、（４）前記金属粒子が析出し、かつ還元剤が付着した支持体を、前記金属粒子の金属錯体を含む水溶液に浸漬し、支持体に金属粒子を析出させる又は成長させる工程と、を含む金属粒子含有支持体の製造方法によって、解決することができる。【選択図】なし