CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

To suppress an electrooptical lens barrel from tilting.SOLUTION: A charged particle beam lithography apparatus according to one embodiment comprises: a stage on which an object substrate of lithography is mounted; a chamber in which the stage is arranged, and which has a carrying-in/out opening part for the stage formed in one side face and also closed with a door; and an electrooptical lens barrel arranged on the chamber. An outer surface and an inner surface of the door protrude between an upper end and a lower end of the door out of the chamber from the upper end or lower end. The upper half-side outer surface and inner surface of the door are inclined surfaces located more outward on a more lower side, and the lower half-side outer surface and inner surface are inclined surfaces located more outward on a more upper side.SELECTED DRAWING: Figure 1 【課題】電子光学鏡筒の傾斜を抑制する。【解決手段】一実施形態に係る荷電粒子ビーム描画装置は、描画対象基板を載置するステージと、前記ステージを内部に配置し、１つの側面に前記ステージの搬出入用の開口部が形成され、前記開口部が扉で塞がれたチャンバと、前記チャンバ上に配置された電子光学鏡筒と、を備える。前記扉の外面及び内面は、前記扉の上端または下端より前記上端と前記下端の間が前記チャンバの外方に突出する。前記扉の上半側の外面及び内面が、下方ほど外方に位置する斜面となっており、下半側の外面及び内面が、上方ほど外方に位置する斜面となっている。【選択図】図１