GLASS PARTICLES, CONDUCTIVE COMPOSITION THEREWITH AND PRODUCTION METHOD OF GLASS PARTICLES

To provide glass particles having less aggregation between particles while having an appropriately small particle size and having high dispersibility when mixed with other material and a production method thereof.SOLUTION: Glass particles of the present invention have a ratio D/Dof a volume cumulati...

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Bibliographische Detailangaben
Hauptverfasser: ODA AKIHIRO, ENDO YASUTOSHI, MATSUYAMA TOSHIKAZU, HASHIMOTO KENSUKE
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide glass particles having less aggregation between particles while having an appropriately small particle size and having high dispersibility when mixed with other material and a production method thereof.SOLUTION: Glass particles of the present invention have a ratio D/Dof a volume cumulative particle size Din a cumulative volume 50 vol% due to a laser diffraction scattering particle size distribution measurement method relative to a volume cumulative particle size Din a cumulative volume 50 vol% measured by a scanning electron microscope observation of 8.0 or smaller, and Dis 100 nm or larger and 700 nm or smaller. Furthermore, a production method of the present invention has a step of generating glass particles by cooling after the gasification of the mother powder by supplying to the glass mother powder to a plasma flame in a laminar flow condition generated in a chamber, pressure inside of the chamber is set lower by 20 kPa or larger and 40 kPa or smaller than atmospheric pressure, and a ratio of a plasma output to a supply amount of the glass mother powder is set to 0.01 kW min/g or larger and 20 kW min/g or lower.SELECTED DRAWING: None 【課題】適度に小さい粒径を有しつつも、粒子どうしの凝集が少なく、且つ他の材料と混合したときの分散性が高いガラス粒子及びその製造方法を提供すること。【解決手段】本発明のガラス粒子は、走査型電子顕微鏡観察によって測定された累積体積50容量%における体積累積粒径DSEM50に対するレーザー回折散乱式粒度分布測定法による累積体積50容量%における体積累積粒径D50の比D50/DSEM50が8.0以下であり、DSEM50が100nm以上700nm以下である。また、本発明の製造方法は、チャンバー内に発生させた層流状態のプラズマフレームにガラス母粉を供給して母粉をガス化させた後冷却して、ガラス粒子を生成させる工程を有し、チャンバー内部の圧力を大気圧よりも20kPa以上40kPa以下低くし、ガラス母粉の供給量に対するプラズマ出力の比を0.01kW・min/g以上20kW・min/g以下とする。【選択図】なし