VAPOR DEPOSITION APPARATUS AND ADAPTER FOR NOZZLE

To provide a vapor deposition apparatus capable of improving use efficiency of a vapor deposition material, and to provide an adapter for a nozzle.SOLUTION: A vapor deposition apparatus includes an evaporation source. The evaporation source has a housing box for housing a vapor deposition material t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OSONO SHUJI, UMEHARA SEIJI, KUMITA KENTARO
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a vapor deposition apparatus capable of improving use efficiency of a vapor deposition material, and to provide an adapter for a nozzle.SOLUTION: A vapor deposition apparatus includes an evaporation source. The evaporation source has a housing box for housing a vapor deposition material to be deposited on a vapor deposition object, and a first nozzle having a first nozzle hole for emitting, toward the vapor deposition object, a vaporization material of the vapor deposition material provided on a facing surface to the vapor deposition object in the housing box. A hole axis of the first nozzle hole is nonparallel to a normal line to an aperture on the emission side of the vapor deposition material of the first nozzle hole.SELECTED DRAWING: Figure 1 【課題】蒸着材料の使用効率を向上させることが可能な蒸着装置及びノズル用アダプタを提供する。【解決手段】蒸着装置は、蒸発源を具備する。上記蒸発源は、蒸着対象物に成膜する蒸着材料を収容する収容箱と、上記収容箱の上記蒸着対象物との対向面に設けられた上記蒸着材料の気化物質を上記蒸着対象物に向かって出射する第1のノズル孔を有する第1のノズルと、を有し、上記第1のノズル孔の孔軸と、上記第1のノズル孔の前記蒸着材料が出射される側の開口面に対する法線とは非平行である。【選択図】図1