SELECTIVE, ELECTROCHEMICAL ETCHING OF SEMICONDUCTOR

To provide a method for selectively removing a heavily doped semiconductor layer.SOLUTION: A method hereof is a one for facilitating fabricating a semiconductor structure. The method comprises the steps of: a step of providing a multilayer structure including a semiconductor layer, the semiconductor...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RAJENDRA P DAHAL, ISHWARA B BHAT, CHOW TAT-SING
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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