METHOD FOR FORMING BANK PATTERN
To provide a method for forming a bank pattern.SOLUTION: A method for forming a bank pattern includes: an underlay film formation step of applying a first photosensitive resin composition containing component (A), component (C) and component (D) onto a substrate directly or through other layer, and...
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Zusammenfassung: | To provide a method for forming a bank pattern.SOLUTION: A method for forming a bank pattern includes: an underlay film formation step of applying a first photosensitive resin composition containing component (A), component (C) and component (D) onto a substrate directly or through other layer, and providing an underlay film; a resist film formation step of applying a second photosensitive resin composition containing component (a), component (b), component (c) and component (d) onto the underlay film, and providing a resist film; and a bank formation step of exposing the resist film with light and developing the resist film, thereby forming a bank, and removing the underlay film of a non-bank part together with the resist film of the non-bank part in the development step. Component (A): an alkali-soluble resin having an amide group, component (C): a solvent, component (D): a photosensitive agent, component (a): an alkali-soluble resin, component (b): a polymer having a water-repellent group (b1), component (c): a solvent, and component (d): a photosensitive agent.SELECTED DRAWING: Figure 1
【課題】バンクパターンの形成方法を提供する。【解決手段】基板上に直接または他の層を介して、(A)成分、(C)成分及び(D)成分を含有する第一の感光性樹脂組成物を塗布して、下層膜を設ける下層膜形成工程と、下層膜上に、(a)成分、(b)成分、(c)成分及び(d)成分を含有する第二の感光性樹脂組成物を塗布して、レジスト膜を設けるレジスト膜形成工程と、該レジスト膜を露光しそして現像することにより、バンクを形成し、その現像過程において非バンク部の下層膜が非バンク部のレジスト膜と共に除去されるバンク形成工程とを含むバンクパターンの形成方法。(A)成分:アミド基を有するアルカリ可溶性樹脂、(C)成分:溶剤、(D)成分:感光剤、(a)成分:アルカリ可溶性樹脂、(b)成分:撥液性基(b1)を有する重合体、(c)成分:溶剤、(d)成分:感光剤。【選択図】図1 |
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