PRODUCTION OF MULTILAYER FILM STRUCTURE

To provide a production of a multilayer film structure, which is enabled to acquire excellent characteristics by suppressing the oxidation of a metal film.SOLUTION: A metal film is formed by using a first metal target, and a first dielectric film is formed on the metal film by feeding an inert gas b...

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Bibliographische Detailangaben
1. Verfasser:	SUGAWARA TOSHIAKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a production of a multilayer film structure, which is enabled to acquire excellent characteristics by suppressing the oxidation of a metal film.SOLUTION: A metal film is formed by using a first metal target, and a first dielectric film is formed on the metal film by feeding an inert gas by means of a second metal containing target having an activated surface. After this, a second dielectric film is formed over the first dielectric film by the supply of a reactive gas. A sputtering target having an activated surface is used to form a dielectric film in a metal mode over a metal film 1 so that the oxidation of the metal film 1 can be suppressed.SELECTED DRAWING: Figure 1 【課題】金属膜の酸化を抑制し、優れた特性を得ることができる多層膜構造体の製造方法を提供する。【解決手段】第１の金属ターゲットを用いて、金属膜を成膜し、表面が活性化された第２の金属含有ターゲットを用いて、不活性ガスの供給により金属膜上に第１の誘電体膜を成膜した後、反応性ガスの供給により第１の誘電体膜上に第２の誘電体膜を成膜する。表面が活性化されたスパッタリングターゲットを用いて、金属モードにて金属膜１上に誘電体膜を成膜することにより、金属膜１の酸化を抑制することができる。【選択図】図１