ELECTROSTATIC INDUCTION TYPE CONVERSION DEVICE AND MANUFACTURING METHOD THEREOF
To provide an electrostatic induction type conversion device that uses a substrate with an electret film formed on both sides so as to ensure electrical conduction to the substrate and not to impair a charge holding amount of the electret film.SOLUTION: An electrostatic induction type conversion dev...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide an electrostatic induction type conversion device that uses a substrate with an electret film formed on both sides so as to ensure electrical conduction to the substrate and not to impair a charge holding amount of the electret film.SOLUTION: An electrostatic induction type conversion device includes: an electret substrate 3 having a conductive substrate 33, an electret film 31 formed on both surfaces of the substrate 33, and a moisture-proof layer 32 which is formed on both sides and side surfaces of the substrate 33 so as to cover the electret film 31 and has at least one opening 37 allowing for an access to the substrate 33 on the side surface of the substrate 33; a first counter electrode arranged so as to face the electret film 31 on one surface side of the substrate 33; and a second counter electrode arranged so as to face the electret film 31 on the other surface side of the substrate 33.SELECTED DRAWING: Figure 9
【課題】両面にエレクトレット膜が形成された基板を使用する静電誘導型変換器において、基板への電気的導通を確保するとともに、エレクトレット膜の電荷保持量を損なわないようにすること。【解決手段】導電性の基板33と、基板33の両面に形成されたエレクトレット膜31と、エレクトレット膜31を覆うように基板33の両面及び側面に形成されるとともに、基板33の側面において、基板33へのアクセスを可能にする少なくとも一つの開口37を有する防湿層32と、を有するエレクトレット基板3と、基板33の一の面側において、エレクレット膜31に対向して配置された第1対向電極と、基板33の他の面側において、エレクレット膜31に対向して配置された第2対向電極と、を有する静電誘導型変換器。【選択図】図9 |
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