PHOTOEMISSION ELECTRON MICROSCOPE

To provide a photoemission electron microscope that has high spatial resolving power capable of observing a bulk sample.SOLUTION: A photoemission electron microscope is composed of: an objective lens 6 that is an electric field magnetic field overlapping type characterized in which a tip 13 of a yok...

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Hauptverfasser: TSUNO KATSUSHIGE, MUTO MASAO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a photoemission electron microscope that has high spatial resolving power capable of observing a bulk sample.SOLUTION: A photoemission electron microscope is composed of: an objective lens 6 that is an electric field magnetic field overlapping type characterized in which a tip 13 of a yoke cone part 15 facing a sample 9 is shaped into a ring (an external diameter r1 and inner diameter r2), the external diameter r1 is more than three times a distance g between the tip 13 and sample 9, an angle (cone angle) 14 formed with the yoke cone part 15 with respect to a surface 13 (in this fig., a horizontally arranged sample stand 30) vertical to an optical axis 12 is equal to or more than 20°, and in a yoke outer peripheral part 18, a boring part 17 is provided symmetrically relative to an axis at even portions; and a two-stage mirror aberration corrector in which an aberration corrector 32 has two pairs of mirror type aberration correctors coaxially faced and arranged.SELECTED DRAWING: Figure 3 【課題】バルク試料を観察できる高い空間分解能を有する光電子顕微鏡。【解決手段】対物レンズ6は、試料9に対面するヨーク円錐部15の先端13がリング形状(外径r1、内径r2)をなし、外形r1は先端13と試料9との距離gの3倍以上であって、光軸12に垂直な面13(この図では水平に配置された試料台30)に対するヨーク円錐部15との角度(円錐角)14を20°以上とし、ヨーク外周部18に、穿孔部17を軸対称に偶数箇所設けたことを特徴とする電場磁場重畳型であり、収差補正器32は二組のミラー型収差補正器を同軸上に対面して配置したことを特徴とする二段ミラー収差補正器とから構成される。【選択図】図3