METHOD FOR PRODUCING POROUS LAYER, POROUS LAYER AND ELECTRODE

To provide a porous material and electrode that has excellent permeability.SOLUTION: Provided is a method for producing a porous layer, including: a preparation step of preparing a porous forming layer containing a polymerizable compound, a polymerization initiator and a solvent on a substrate; a po...

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Hauptverfasser:	OKIMOTO MIKU, GOKOCHI TORU, TAKAUJI KEIGO, YANAGIDA HIDEO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	To provide a porous material and electrode that has excellent permeability.SOLUTION: Provided is a method for producing a porous layer, including: a preparation step of preparing a porous forming layer containing a polymerizable compound, a polymerization initiator and a solvent on a substrate; a polymerization step of activating the polymerization initiator to form a porous skeleton by polymerization of the polymerizable compound; and a solvent removal step of removing the solvent contained in the porous forming layer to obtain a porous layer, and in which the polymerization step is performed at a temperature lower than the temperature in the solvent removal step.SELECTED DRAWING: Figure 1 【課題】透過性に優れた多孔質および電極を得ることを目的とする。【解決手段】基材上に、重合性化合物、重合開始剤および溶媒を含む多孔質形成層を準備する準備工程と、前記重合開始剤を活性化させて前記重合性化合物の重合により多孔質骨格を形成する重合工程と、前記多孔質形成層に含まれる溶媒を除去して多孔質層を得る溶媒除去工程と、を備え、前記重合工程は、前記溶媒除去工程における温度よりも低い温度で行われる多孔質層の製造方法である。【選択図】図１