PLASMA CLEANING DEVICE AND PLASMA CLEANING METHOD

To solve problems of failure and life deterioration or the like of a plasma cleaning device caused by overtemperature of a device installed in a vacuum duct.SOLUTION: A plasma cleaning device 1 includes a magnetic field generation part 11 which generates a magnetic field, a microwave generation source 22 which generates a microwave, and a gas supply source 32 which supplies gas, and generates plasma inside a vacuum duct, on which the magnetic field is applied, to plasma-clean an inner wall surface of the vacuum duct. The plasma cleaning device 1 further includes an operation control device 51. The operation control device 51 adjusts power of the plasma by controlling at least one of a magnetic field generation power supply 12 for the magnetic field generation part 11, the microwave generation source 22, and the gas supply source 32 in response to a temperature of the vacuum duct.SELECTED DRAWING: Figure 2 【課題】プラズマ洗浄装置において、真空ダクトに設置された機器の過温度に伴う故障や寿命劣化等の問題を解決すること。【解決手段】プラズマ洗浄装置１は、磁場を発生する磁場発生部１１と、マイクロ波を発生するマイクロ波発生源２２と、ガスを供給するガス供給源３２とを備え、磁場が印加された真空ダクトの内部にプラズマを発生させて真空ダクトの内壁面をプラズマ洗浄する。プラズマ洗浄装置１は、運転制御装置５１を更に備える。運転制御装置５１は、真空ダクトの温度に応じて、磁場発生部１１用の磁場発生用電源１２と、マイクロ波発生源２２と、ガス供給源３２とのうち少なくとも１つを制御することで、プラズマの電力を調整する。【選択図】 図２