SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM

To provide a substrate processing apparatus that is effective to improve positioning accuracy of a substrate to a processing position.SOLUTION: A substrate processing apparatus comprises: a conveyance apparatus that conveys a substrate which is at least one processing object; a conveyance control section that causes the conveyance apparatus to perform normal conveyance of conveying the substrate and high accuracy conveyance of conveying the substrate with a positioning accuracy higher than that of the normal conveyance; a warm-up control section that causes the conveyance apparatus to perform a warm-up operation different from those of the normal conveyance and the high accuracy conveyance on an as-needed basis; and a necessity/non-necessity determination section that determines necessity of the warm-up operation according to approaching at start time of the high accuracy conveyance when duration of a stop state of the conveyance apparatus exceeds a predetermined reference time.SELECTED DRAWING: Figure 5 【課題】処理位置への基板の位置決め精度を向上させるのに有効な基板処理装置を提供する。【解決手段】基板処理装置は、少なくとも一つの処理対象の基板を搬送する搬送装置と、基板を搬送する通常搬送と、通常搬送に比較して高い位置決め精度で基板を搬送する高精度搬送とを搬送装置に行わせる搬送制御部と、必要に応じて通常搬送及び高精度搬送とは別のウォームアップ動作を搬送装置に行わせるウォームアップ制御部と、搬送装置の停止状態の継続時間が予め設定された基準時間を越えている場合に、高精度搬送の開始時の接近に応じてウォームアップ動作が必要と判定する要否判定部と、を備える。【選択図】図５