LIQUID DISCHARGE NOZZLE AND SEMICONDUCTOR MANUFACTURING DEVICE

To inhibit maintenance of a state in which a retention liquid adheres to an opening side of a nozzle, in a period when suction processing is performed.SOLUTION: A nozzle 10 has conductivity. The nozzle 10 has a structure X1 that decreases an adhesive force generated when a retention liquid existing...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IDA KOJI, ANABUKI KAZUTOSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY NOZZLES PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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