SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

To improve accuracy for the control of a substrate temperature in substrate processing in which the substrate is processed while being held on a rotary table.SOLUTION: A substrate processing apparatus includes: a rotation driving mechanism configured to rotate a rotary table around a vertical axis, the rotary table holding a substrate; an electric heater provided at the rotary table to be rotated along with the rotary table and configured to heat the substrate; a power receiving electrode provided at the rotary table to be rotated along with the rotary table and electrically connected to the electric heater; a power feeding electrode configured to be contacted with the power receiving electrode to supply drive power to the electric heater via the power receiving electrode; an electrode moving mechanism configured to connect and disconnect the power feeding electrode and the power receiving electrode relatively; a power feeder configured to supply the drive power to the power feeding electrode; a processing cup configured to surround the periphery of the rotary table; at least one processing liquid nozzle configured to supply a processing liquid onto the substrate; a processing liquid supply mechanism configured to supply the processing liquid to the processing liquid nozzle; and a controller configured to control the electrode moving mechanism, the power feeder, the rotation driving mechanism and the processing liquid supply mechanism.SELECTED DRAWING: Figure 2 【課題】回転テーブルに基板を保持した状態で基板の処理を行う基板処理において、基板温度の制御精度を向上させる。【解決手段】基板処理装置は、基板を保持した回転テーブルを回転駆動機構と、回転テーブルと一緒に回転するように回転テーブルに設けられ基板を加熱する電気ヒーターと、回転テーブルと一緒に回転するように回転テーブルに設けられ、電気ヒーターに電気的に接続された受電電極と、受電電極と接触して受電電極を介して電気ヒーターに駆動電力を供給する給電電極と、給電電極と受電電極とを相対的に接離させる電極移動機構と、給電電極に駆動電力を供給する給電部と、回転テーブルの周囲を囲む処理カップと、基板に処理液を供給する少なくとも１つの処理液ノズルと、処理液ノズルに処理液を供給する処理液供給機構と、電極移動機構、給電部、回転駆動機構および処理液供給機構を制御する制御部とを備える。【選択図】図２