PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, AND CURED FILM

To provide a photosensitive resin composition excellent in patterning characteristics, a method for producing a cured film, and a cured product.SOLUTION: The photosensitive resin composition contains an alkali-soluble resin (A), a crosslinking agent (B), and a photopolymerization initiator (C). The...

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Hauptverfasser:	SHIODA MASARU, TADOKORO KEISUKE
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	To provide a photosensitive resin composition excellent in patterning characteristics, a method for producing a cured film, and a cured product.SOLUTION: The photosensitive resin composition contains an alkali-soluble resin (A), a crosslinking agent (B), and a photopolymerization initiator (C). The photosensitive resin composition contains, as the crosslinking agent (B), a monofunctional (meth)acrylic monomer (B1) having an optionally substituted biphenyl skeleton or an optionally substituted terphenyl skeleton.SELECTED DRAWING: None 【課題】パターニング特性に優れる感光性樹脂組成物、硬化膜の製造方法、及び硬化物、を提供すること。【解決手段】アルカリ可溶性樹脂（Ａ）と、架橋剤（Ｂ）と、光重合開始剤（Ｃ）とを含む、感光性樹脂組成物であって、前記架橋剤（Ｂ）として、置換基を有していてもよいビフェニル骨格、又は置換基を有してもよいターフェニル骨格を有する単官能（メタ）アクリルモノマー（Ｂ１）を含む、感光性樹脂組成物。【選択図】なし