APPARATUS AND METHOD FOR SUPPLYING TARGET MATERIAL

To supply a target material dispenser with target material in a manner which does not add undue mass to the target material dispenser.SOLUTION: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository. Solid target m...

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Bibliographische Detailangaben
Hauptverfasser:	CHIRAG RAJYAGURU, PETER MICHAEL BAUMGART, ISHIKAWA TETSUYA, JOHN MARTIN ALGOTS
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	To supply a target material dispenser with target material in a manner which does not add undue mass to the target material dispenser.SOLUTION: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository. Solid target material in the target material repository is converted to target material in a liquid form through the use of induction heating.SELECTED DRAWING: Figure 3 【課題】ターゲット材料ディスペンサに過度の質量を付加しないようにターゲット材料ディスペンサにターゲット材料を供給する。【解決手段】ターゲット材料ディスペンサ及びターゲット材料貯蔵庫を含むＥＵＶ光源ターゲット材料ハンドリングシステムが開示される。ターゲット材料貯蔵庫内の固体ターゲット材料が、誘導加熱の使用により、液状のターゲット材料に変換される。【選択図】図３