MANUFACTURING APPARATUS OF RESIN FILM SUBSTRATE WITH METAL FILM EQUIPPED WITH ION BEAM PROCESSING MEANS, AND MANUFACTURING METHOD OF THE SAME

To provide a manufacturing apparatus and manufacturing method where ion beam processing hardly causes trough wrinkles on a long-sized resin film.SOLUTION: A manufacturing apparatus of a resin film substrate with a metal film is equipped with vacuum film deposition means such as magnetron sputtering...

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1. Verfasser: OGAMI HIDEHARU
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a manufacturing apparatus and manufacturing method where ion beam processing hardly causes trough wrinkles on a long-sized resin film.SOLUTION: A manufacturing apparatus of a resin film substrate with a metal film is equipped with vacuum film deposition means such as magnetron sputtering cathodes 46-49 that deposits a metal film on a long-sized resin film A conveyed by a roll-to-roll method under a vacuum condition. Upstream of the vacuum film deposition means, an ion beam irradiation means 35 installed in the manufacturing apparatus irradiates an ion beam toward two linear regions that connect a central part in the width direction of a conveying route of the resin film A and both end parts in the width direction downstream of the central part in the conveying direction and incline at preferably 30-60 degrees toward the conveying direction of the conveying route.SELECTED DRAWING: Figure 2 【課題】 イオンビーム処理を長尺樹脂フィルムに施してもトラフシワが発生しにくい製造装置及び製造方法を提供する。【解決手段】 真空中においてロールツーロール方式で搬送される長尺の樹脂フィルムAに金属膜を成膜するマグネトロンスパッタリングカソード46〜49等の真空成膜手段を備えた金属膜付樹脂フィルム基板の製造装置であって、該真空成膜手段よりも上流側において、樹脂フィルムAの搬送経路の幅方向中央部と該中央部よりも搬送方向下流側の幅方向両端部とを結ぶ好適には該搬送経路の搬送方向に対して30〜60°傾斜する2条の直線状領域に向けてイオンビームを照射するイオンビーム照射手段35が設けられている。【選択図】 図2