METHOD FOR MANUFACTURING CARBON NANOPARTICLE

To provide a method and apparatus for easily manufacturing carbon nanoparticles.SOLUTION: A method for manufacturing carbon nanoparticles comprises: arranging a multi-hollow discharge electrode 101 having a plurality of through holes in a chamber and a sputtering electrode 102 holding a carbon targe...

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Hauptverfasser:	NAKATANI TATSUYUKI, KOGA KAZUNORI, SHIRATANI MASAHARU, YONEZAWA TAKESHI, HUANG CHENG HE, ITO MASAFUMI, WU ZHUOXI, OTA YUKI, TAKAHASHI KIYOMI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a method and apparatus for easily manufacturing carbon nanoparticles.SOLUTION: A method for manufacturing carbon nanoparticles comprises: arranging a multi-hollow discharge electrode 101 having a plurality of through holes in a chamber and a sputtering electrode 102 holding a carbon target; arranging a base material 301 at a position facing the multi-hollow discharge electrode 101 and the sputtering electrode 102; and supplying a raw material gas including carbon into the chamber 105 through the through holes and supplying high frequency electric power to the multi-hollow discharge electrode 101 and converting the raw material gas passing through the holes into plasma to deposit carbon nanoparticles on the base material 301.SELECTED DRAWING: Figure 1 【課題】カーボンナノ粒子を容易に製造できる製造方法及び製造装置の提供。【解決手段】チャンバ内に複数の貫通孔を有するマルチホロー放電電極１０１及び炭素ターゲットを保持するスパッタ電極１０２を配置し、マルチホロー放電電極１０１及びスパッタ電極１０２と対向する位置に基材３０１を配置し、炭素を含む原料ガスを貫通孔を通してチャンバ１０５内に供給すると共に、マルチホロー放電電極１０１に高周波電力を供給して、貫通孔を通過する原料ガスをプラズマ化して基材３０１にカーボンナノ粒子を堆積させるカーボンナノ粒子の製造方法。【選択図】図１