ELECTRODE DEVICE AND PLASMA GENERATION DEVICE

To provide an electrode device for a plasma generation device capable of generating relatively low-temperature plasma with a simple configuration and performing surface treatment of an object to be processed.SOLUTION: An electrode device 1' includes an upper electrode 3 including a pair of side...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MORI TAMIO, KURODA SHINICHI, HOSOI KATSUHIKO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS THEIR RELEVANT APPARATUS TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	To provide an electrode device for a plasma generation device capable of generating relatively low-temperature plasma with a simple configuration and performing surface treatment of an object to be processed.SOLUTION: An electrode device 1' includes an upper electrode 3 including a pair of side electrodes 3a and 3b on the surface of a substrate 2, and a cross electrode 3c electrically connected to the pair of side electrodes 3a and 3b, and provided between the side electrodes 3a and 3b. A lower electrode 4 is arranged in a facing region S facing a portion of the cross electrode 3c on the back surface of the substrate 2.SELECTED DRAWING: Figure 2A 【課題】簡易な構成で比較的低温のプラズマを発生させ、被処理対象物の表面処理を行えるプラズマ発生装置用の電極装置を提供する。【解決手段】電極装置１'は、基板２の表面上に一対の側部電極３ａ，３ｂと、一対の側部電極３ａ，３ｂに電気的に接続され、その間に設けられた桟電極３ｃとからなる上部電極３を有している。基板２の裏面上には、桟電極３ｃの部分に対向する対向領域Ｓに配置され、対向領域Ｓ内に設けられた下部電極４を有している。【選択図】図２Ａ