ANTIREFLECTION FILM, OPTICAL ELEMENT AND METHOD FOR DEPOSITING ANTIREFLECTION FILM
To provide: an antireflection film having low reflectance, small unevenness of reflected color and excellent durability; an optical element including the same; and a film deposition method excellent in the productivity of such an antireflection film.SOLUTION: An antireflection film 1 includes a mult...
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| creator | KAWAMATA KAZUO HASHIMOTO RYO SHIBUYA MINORU |
| description | To provide: an antireflection film having low reflectance, small unevenness of reflected color and excellent durability; an optical element including the same; and a film deposition method excellent in the productivity of such an antireflection film.SOLUTION: An antireflection film 1 includes a multilayer structure provided on the side of the convex optical surface 11a of an optical element 11 having a convex optical surface 11a having the maximum inclination angle of 25° or more. In each optical thin film 2 constituting the multilayer structure, a filling ratio at any point is 90% or more; a L value in a CIE1976 Labcolor system satisfies the following conditional expressions (1); a difference Δa between a values in any two points and a difference Δb between b values in the two points satisfy the following conditional expressions (2). L |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2020030237A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2020030237A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2020030237A3</originalsourceid><addsrcrecordid>eNrjZAhy9AvxDHJ183F1DvH091Nw8_Tx1VHwDwjxdHb0UXD1cfV19QtRcPRzUfB1DfHwd1Fw8w9ScHEN8A_2DPH0c1fAop2HgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsR7BRgZGBkYGBsYGZs7GhOlCAAkyC_k</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ANTIREFLECTION FILM, OPTICAL ELEMENT AND METHOD FOR DEPOSITING ANTIREFLECTION FILM</title><source>esp@cenet</source><creator>KAWAMATA KAZUO ; HASHIMOTO RYO ; SHIBUYA MINORU</creator><creatorcontrib>KAWAMATA KAZUO ; HASHIMOTO RYO ; SHIBUYA MINORU</creatorcontrib><description>To provide: an antireflection film having low reflectance, small unevenness of reflected color and excellent durability; an optical element including the same; and a film deposition method excellent in the productivity of such an antireflection film.SOLUTION: An antireflection film 1 includes a multilayer structure provided on the side of the convex optical surface 11a of an optical element 11 having a convex optical surface 11a having the maximum inclination angle of 25° or more. In each optical thin film 2 constituting the multilayer structure, a filling ratio at any point is 90% or more; a L value in a CIE1976 Labcolor system satisfies the following conditional expressions (1); a difference Δa between a values in any two points and a difference Δb between b values in the two points satisfy the following conditional expressions (2). L<5...(1), (Δa+Δb)<5...(2)SELECTED DRAWING: Figure 1
【課題】 本件発明は、反射率が低くて反射色のムラが小さく、耐久性に優れた反射防止膜及びそれを備える光学素子を提供することを目的とする。さらに、そのような反射防止膜の生産性に優れた成膜方法を提供することを目的とする。【解決手段】 本件発明に係る反射防止膜は、最大傾斜角度が２５°以上である凸の光学面１１ａを有する光学素子１１の、凸の光学面１１ａ側に設ける多層構造を備える反射防止膜１であって、多層構造を構成する各光学薄膜２は、任意の箇所の充填率が９０％以上であり、ＣＩＥ１９７６のＬ＊ａ＊ｂ＊表色系におけるＬ値が以下の条件式（１）を満たし、任意の２箇所におけるａ値の差Δａ及び当該２箇所におけるｂ値の差をΔｂが以下の条件式（２）を満たす。Ｌ＜５ ...（１）（Δａ２＋Δｂ２）１／２＜５ ...（２）【選択図】図１</description><language>eng ; jpn</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200227&DB=EPODOC&CC=JP&NR=2020030237A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200227&DB=EPODOC&CC=JP&NR=2020030237A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWAMATA KAZUO</creatorcontrib><creatorcontrib>HASHIMOTO RYO</creatorcontrib><creatorcontrib>SHIBUYA MINORU</creatorcontrib><title>ANTIREFLECTION FILM, OPTICAL ELEMENT AND METHOD FOR DEPOSITING ANTIREFLECTION FILM</title><description>To provide: an antireflection film having low reflectance, small unevenness of reflected color and excellent durability; an optical element including the same; and a film deposition method excellent in the productivity of such an antireflection film.SOLUTION: An antireflection film 1 includes a multilayer structure provided on the side of the convex optical surface 11a of an optical element 11 having a convex optical surface 11a having the maximum inclination angle of 25° or more. In each optical thin film 2 constituting the multilayer structure, a filling ratio at any point is 90% or more; a L value in a CIE1976 Labcolor system satisfies the following conditional expressions (1); a difference Δa between a values in any two points and a difference Δb between b values in the two points satisfy the following conditional expressions (2). L<5...(1), (Δa+Δb)<5...(2)SELECTED DRAWING: Figure 1
【課題】 本件発明は、反射率が低くて反射色のムラが小さく、耐久性に優れた反射防止膜及びそれを備える光学素子を提供することを目的とする。さらに、そのような反射防止膜の生産性に優れた成膜方法を提供することを目的とする。【解決手段】 本件発明に係る反射防止膜は、最大傾斜角度が２５°以上である凸の光学面１１ａを有する光学素子１１の、凸の光学面１１ａ側に設ける多層構造を備える反射防止膜１であって、多層構造を構成する各光学薄膜２は、任意の箇所の充填率が９０％以上であり、ＣＩＥ１９７６のＬ＊ａ＊ｂ＊表色系におけるＬ値が以下の条件式（１）を満たし、任意の２箇所におけるａ値の差Δａ及び当該２箇所におけるｂ値の差をΔｂが以下の条件式（２）を満たす。Ｌ＜５ ...（１）（Δａ２＋Δｂ２）１／２＜５ ...（２）【選択図】図１</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhy9AvxDHJ183F1DvH091Nw8_Tx1VHwDwjxdHb0UXD1cfV19QtRcPRzUfB1DfHwd1Fw8w9ScHEN8A_2DPH0c1fAop2HgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsR7BRgZGBkYGBsYGZs7GhOlCAAkyC_k</recordid><startdate>20200227</startdate><enddate>20200227</enddate><creator>KAWAMATA KAZUO</creator><creator>HASHIMOTO RYO</creator><creator>SHIBUYA MINORU</creator><scope>EVB</scope></search><sort><creationdate>20200227</creationdate><title>ANTIREFLECTION FILM, OPTICAL ELEMENT AND METHOD FOR DEPOSITING ANTIREFLECTION FILM</title><author>KAWAMATA KAZUO ; HASHIMOTO RYO ; SHIBUYA MINORU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2020030237A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2020</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWAMATA KAZUO</creatorcontrib><creatorcontrib>HASHIMOTO RYO</creatorcontrib><creatorcontrib>SHIBUYA MINORU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWAMATA KAZUO</au><au>HASHIMOTO RYO</au><au>SHIBUYA MINORU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ANTIREFLECTION FILM, OPTICAL ELEMENT AND METHOD FOR DEPOSITING ANTIREFLECTION FILM</title><date>2020-02-27</date><risdate>2020</risdate><abstract>To provide: an antireflection film having low reflectance, small unevenness of reflected color and excellent durability; an optical element including the same; and a film deposition method excellent in the productivity of such an antireflection film.SOLUTION: An antireflection film 1 includes a multilayer structure provided on the side of the convex optical surface 11a of an optical element 11 having a convex optical surface 11a having the maximum inclination angle of 25° or more. In each optical thin film 2 constituting the multilayer structure, a filling ratio at any point is 90% or more; a L value in a CIE1976 Labcolor system satisfies the following conditional expressions (1); a difference Δa between a values in any two points and a difference Δb between b values in the two points satisfy the following conditional expressions (2). L<5...(1), (Δa+Δb)<5...(2)SELECTED DRAWING: Figure 1
【課題】 本件発明は、反射率が低くて反射色のムラが小さく、耐久性に優れた反射防止膜及びそれを備える光学素子を提供することを目的とする。さらに、そのような反射防止膜の生産性に優れた成膜方法を提供することを目的とする。【解決手段】 本件発明に係る反射防止膜は、最大傾斜角度が２５°以上である凸の光学面１１ａを有する光学素子１１の、凸の光学面１１ａ側に設ける多層構造を備える反射防止膜１であって、多層構造を構成する各光学薄膜２は、任意の箇所の充填率が９０％以上であり、ＣＩＥ１９７６のＬ＊ａ＊ｂ＊表色系におけるＬ値が以下の条件式（１）を満たし、任意の２箇所におけるａ値の差Δａ及び当該２箇所におけるｂ値の差をΔｂが以下の条件式（２）を満たす。Ｌ＜５ ...（１）（Δａ２＋Δｂ２）１／２＜５ ...（２）【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | ANTIREFLECTION FILM, OPTICAL ELEMENT AND METHOD FOR DEPOSITING ANTIREFLECTION FILM |
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